Armed with the world's largest digital camera, the Vera C. Rubin Observatory in Chile will take night-sky images that ...

Large-scale microscopy combined with tissue clearing and expansion enables nanoscale imaging of centimeter scale specimens.

ASML Holding is the critical bottleneck in the AI supply chain, uniquely enabling next-gen chip production with its advanced EUV lithography systems. Learn more on ASML stock here.

Discover why we've given the ZWO Seestar S30 smart telescope nearly top marks in our latest smart telescope review.

The cutting-edge High Numerical Aperture Extreme Ultraviolet (High NA EUV) lithography tools, considered crucial for future chipmaking, were widely believed to be a distant prospect for Intel, not ...

In a recent study, researchers have developed a compound metalens that enables distortion-free imaging. The study, published in Engineering, presents a novel approach to on-demand distortion ...

A new technical paper titled “Resolution enhancement for high-numerical aperture extreme ultraviolet lithography by split pupil exposures: a modeling perspective” was published by researchers at ...

The company’s high-NA machines have a numerical aperture of .55. Hyper-NA tools would have a numerical aperture higher than 0.7.

In this paper, a design of high numerical aperture (NA) anamorphic EUV illumination system with large field of view is completed. Simulation results show that the system can satisfied the requirements ...

The SZX10 is specially designed for routine research. With a maximum numerical aperture (NA) of 0.2, producing a resolution of 600 line pairs per millimeter and a zoom ratio of 10:1, more ...