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The NAND gate is designed using DVS and MTCMOS technique gives least power consumption. All the simulations have been performed on Tanner EDA Tool version 14.1.
In this study, we suggest a dual-gate hybrid ferroelectric transistor (DG-HFT) consisting of the vertically stacked tellurium/ α -In2Se3 junction and metal-insulator-semiconductor gate structure. This ...
The excellent performance of the devices with fluorinated PIs was attributed to the enhanced microstructure of the organic semiconductor and the fluorine-rich characteristic of the underlying gate ...
Multicationic oxide semiconductors are receiving considerable interest in electronic and optoelectronic devices owing to their tunability of physical properties by the cation compositions. Here, we ...
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