The mechanical strength and toughness of engineering materials are often mutually exclusive, posing challenges for material ...

The associated research has been published in Optica. It was co-led by Federico Capasso, the Robert L. Wallace Professor of Applied Physics and Vinton Hayes Senior Research Fellow in Electrical ...

Fujifilm Corp. (Tokyo) announced that it has developed a PFAS-free negative-type ArF immersion resist for use in advanced semiconductor manufacturing ...

Merck KGaA, Darmstadt, Germany recently invited leading representatives from the semiconductor industry to Darmstadt to come together and discuss the role ...