A research team led by Professor Kazuaki Sawada and Project Assistant Professor Hideo Doi of the Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology has ...
Substantial ion mobility and low viscosity to support the fast transfer of electrons. - A high diffusion coefficient. - Long-term stability. - Good interfacial contact with the nanocrystalline ...
During its last week before the inauguration, the Biden Administration issued significant and complex new export controls on semiconductors ...
On January 13, 2025, the Department of Commerce’s Bureau of Industry and Security (BIS) published an Interim Final Rule (IFR) that expands controls ...
President Biden’s ruling was entitled: “Export Control Framework for Artificial Intelligence Diffusion.” The statement from SIA ... Eliminating another flaw in sodium-ion batteries Argonne National ...
Released today (January 13), the Interim Final Rule on Artificial Intelligence Diffusion restricts the access of AI ... 2024 and have attracted widespread criticism from across the semiconductor ...
(MENAFN- JCN NewsWire) TANAKA PRECIOUS METAL TECHNOLOGIES Develops AgSn TLP Sheet, a Sheet-type Bonding Material for Power Semiconductors ... 4 Transient liquid phase diffusion bonding, also ...
Take this example: a Microsoft team is just now figuring out how to use a diffusion model to find new ... the Microsoft team talks about innovating lithium-ion batteries, and how the original ...
This industry application has become more difficult in recent years due to regulatory and market pressure to increase ...
U.S. companies like OpenAI and Anthropic lead in developing AI algorithms, while NVIDIA excels in producing semiconductor chips ... or whether they view the diffusion policy as part of a ...
Home Tech Semiconductors Understanding the AI diffusion rule left by Biden: Nvidia's pushback and European concerns Amanda Liang, commentary; Charlene Chen, DIGITIMES Asia Tuesday 21 January 2025 0 ...
Researchers from Lam Research, the University of Colorado Boulder, and Princeton Plasma Physics Laboratory (PPPL) investigated ways to speed up the cryogenic reactive ion etching process for 3D NAND ...