Plasma—the electrically charged fourth state of matter—is at the heart of many important industrial processes, including those used to make computer chips and coat materials. Plasma Physics ...

The discharge plasma-chemical hybrid process for NO/sub x/ removal from the flue gas emissions is an extremely effective and economical approach in comparison with the conventional selective catalytic ...

The plasma-chemical hybrid process developed was extremely effective and economical in comparison with the conventional selective catalytic reduction (SCR) system and other technologies for NO/sub x/ ...

In addition, the adsorption isotherms of ClO 4 – adsorption by the LDO (LDH) were investigated at initial ClO 4 – concentrations of 5, 10, 20, 50, 100, 200, 300, 400, and 500 mg/L at the same ...

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