A precisely calibrated process model is required for the optical proximity correction purpose. To fit the model, a test pattern mask needs to be prepared and the lithographic experiment should be done ...

Learn about OPSC VAS Syllabus 2025, including subject-wise topics, weightage, best books, and preparation tips on this page.

In this article, a compact planar antenna array with multiple beams in the broadside and end-fire radiation patterns using the 4×4 Butler Matrix (BM) is proposed. Proposed antenna generates 4 beams in ...