Will directed self-assembly (DSA) join Extreme Ultraviolet ... Another critical issue cited by the crowd was pattern roughness. DSA is known to suffer from higher levels of line-edge/line-width ...

announced that they have successfully created contact hole patterns for a wide variety of practical logic and memory devices using a next-generation directed self-assembly (DSA) process.

The directed ... self-assembled block copolymer patterns. Adv. Mater. 19, 2157–2162 (2007). Stoykovich, M. P. et al. Remediation of line edge roughness in chemical nanopatterns by the directed ...

Ten years ago, when the industry was struggling to deliver EUV lithography, directed ... pattern that we can guide the self-assembly of a local polymer that will do the work to make a clean pattern.” ...

Figure 1: Conventional and selective directed self-assembly. Figure 2: DSA of lamella and cylinders on chemical line grating patterns. Figure 4: Predictions of an energy model for ordering of a ...

ACS Nano – Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using ... and straight forward DSA platform to generate sub-lithographic line-space patterns and ...

A new paper claims that directed self-assembly could be key to ... The original lithographic pattern forms the guide for the copolymer line position. But the chemical process results in lines ...

By simply adjusting the spacing and thickness of the lithographic line patterns-easy to fabricate ... Stein et al, Selective directed self-assembly of coexisting morphologies using block copolymer ...

Known as directed ... line able to use self-assembly in its pilot fab in 2012. Work there has focused on reducing errors in self-assembled structures through improved materials and better pre ...

A new interface control technique for block co-polymer self-assembly could provide long-sought method for making even tinier patterns on microchips ... up an image line by line, by scanning ...

However, flow instabilities within the evaporating droplet often result in non-equilibrium and irregular dissipative structures, e.g., randomly organized convection patterns ... followed by subsequent ...

Stanford researchers sponsored by SRC have successfully created contact hole patterns for a wide variety of practical logic and memory devices using a next-generation directed self-assembly process.