The problem of variations induced by the chemical-mechanical polishing (CMP) step has been discussed for years in process ... chip performance, even if you do go back and re-close timing. Mentor’s ...

CMP is also offering 65nm and 130nm SOI (Silicon-On-Insulator), as well as 130nm SiGe processes from STMicroelectronics. For example, 170 universities and companies received the design rules and ...

Introduction strengthens STMicroelectronics’ position as a semiconductor technology leader Used by universities, research labs and companies for next generation System-on-Chip ... rules and design ...